The main process change that affects yield is edge-placement error (EPE). This occurs when unexpected nanoscale irregularities are displayed in the edges and sidewalls of photoresist patterns. These irregularities are random and colloquially referred to as line-edge roughness (LER). As device sizes continue to shrink, ……

Absolute radiometric measurement is important not only for the development of lithography processes and instrument acceptance tests but also for the quantitative understanding of EUV light generation processes. Predictive modeling of this process has lagged behind the development of EUV tools themselves. Improving mode……

NIST is currently developing an instrument for measuring SoS at higher pressures and temperatures. The SoS instrument is part of Dr. Elizabeth Rasmussen's National Research Council (NRC) postdoctoral fellowship in metal additive manufacturing. A U.S. patent on the design and operation of the instrument was submitted in……

2.1 Droplet Generator: Extreme Thermophysical Properties and Modeling The droplet generator is an important component of the EUVL scanner assembly (Figure 3)……

Overview of NIST and Chip Metrology Program

In 2022, the semiconductor market was approximately 0.6 trillion USD, and commercial analysts predict that it will double to 1.0-1.3 trillion USD by 2030. The significant growth in the semiconductor manufacturing industry can be seen in the lithography process. Lithography is a patterning process that transfers a flat ……

​Due to the war with Ukraine and the resulting global isolation and sanctions, Russia is devising a plan to revive its struggling domestic semiconductor manufac……

​For the same task, the energy consumption of this chip for on-chip learning is only 3% of that of the Advanced Process-Specific Integrated Circuit (ASIC) syste……

Recently, Reuters reported that OpenAI is considering self-developed chips. According to the report, since last year, OpenAI has been actively seeking solutions to the shortage of training chips for artificial intelligence models (specifically, the scarcity of Nvidia GPUs). Currently, OpenAI is actively preparing for s……

Recently, Reuters reported that OpenAI is considering self-developed chips. According to the report, since last year, OpenAI has been actively seeking solutions to the shortage of training chips for artificial intelligence models (specifically, the scarcity of Nvidia GPUs). Currently, OpenAI is actively preparing for s……

Professor Tang Chuanxiang's team from the Department of Engineering Physics at Tsinghua University has made significant progress in the research of extreme ultraviolet (EUV) lithography machine light sources. This light source project is called SSMB-E

In February of this year, Professor Tang Chuanxiang's research group from the Department of Engineering Physics at Tsinghua University, in collaboration with the Helmholtz-Zentrum Berlin für Materialien und Energie (HZB) and the Physikalisch-Technische Bundesanstalt (PTB) in Germany, published a research paper titled "……